بررسی تغییرات بیان تعدادی از ژن‌های دفاعی در دو رقم حساس و مقاوم به ویروس موزاییک رگه‌ای گندم wheat streak mosaic virus (WSMV)

Wheat streak mosaic virus (WSMV) is one of the most devastating viral pathogens affecting wheat. Understanding the host-pathogen biochemical and molecular interactions is crucial for developing effective control strategies. In this study, we compared the expression changes of several resistance-related genes identified by genome-wide association study (GWAS) in IPK41079 and Alamut wheat cultivars, resistant and susceptible to WSMV-DOLT isolate collected form Isfahan, respectively. The genes analyzed using RT-qPCR included F-box protein (FBP), p-loop-containing nucleotide triphosphate hydrolase, cytochrome P450, Leucine-rich repeat (LRR) protein, reticulon-like protein, WD40 repeat domain protein, UDP-glucuronosyl/UDP-glucosyltransferase and heat shock protein 60 (HSP 60). After mechanical inoculation of resistant and susceptible cultivars, leaf tissues were sampled at various time points: 0, 6, 24, and 72 hours post inoculation (hpi), as well as 20 days post inoculation (dpi). Gene expression analysis revealed significant differences in the relative expression levels of key genes between resistant and susceptible cultivars. Cytochrome P450 and UDP-glucuronosyl/UDP-glucosyltransferase genes showed higher expression levels at 6 to 72 hpi, p-loop-containing nucleotide triphosphate hydrolase and WD40 repeat domain genes exhibited elevated expression at 6 to 72 hpi and 20 dpi, Leucine-rich repeat (LRR) protein and reticulon-like protein genes demonstrated increased expression at 24 hpi, 72 hpi, and 20 dpi and Heat shock protein 60 showed consistently higher expression across all time points evaluated in the resistant cultivar. These results suggest that the higher expression of these genes in the resistant cultivar compared to susceptible cultivar is probably associated with resistance to WSMV and can be used as molecular biomarkers for selection of disease-resistant cultivars after their confirmation and validation.